Affiliation: Keio University
- Discrete distribution of implanted and annealed arsenic atoms in silicon nanowires and its effect on device performanceMasashi Uematsu
School of Fundamental Science and Technology, Keio University, Yokohama, 223 8522, Japan
Nanoscale Res Lett 7:685. 2012..We also found that the on-current fluctuation mainly originated from the randomness of interatomic distances of As atoms and hence is inherent in ultra-small NW transistors...