Simon D Elliott

Summary

Affiliation: Tyndall National Institute
Country: Ireland

Publications

  1. doi request reprint Mechanism, products, and growth rate of atomic layer deposition of noble metals
    Simon D Elliott
    Tyndall National Institute, University College Cork, Lee Maltings, Cork, Ireland
    Langmuir 26:9179-82. 2010
  2. doi request reprint Quantum chemical and solution phase evaluation of metallocenes as reducing agents for the prospective atomic layer deposition of copper
    Gangotri Dey
    Tyndall National Institute, University College Cork, Lee Malting s, Dyke Parade, Cork, Ireland
    Dalton Trans 44:10188-99. 2015
  3. doi request reprint Cooperation between adsorbates accounts for the activation of atomic layer deposition reactions
    Mahdi Shirazi
    Tyndall National Institute, University College Cork, Lee Maltings, Cork, Ireland
    Nanoscale 7:6311-8. 2015
  4. doi request reprint Reduction mechanisms of the CuO(111) surface through surface oxygen vacancy formation and hydrogen adsorption
    Yasheng Maimaiti
    Tyndall National Institute, University College Cork, Lee Maltings, Prospect Row, Cork, Ireland
    Phys Chem Chem Phys 16:3036-46. 2014
  5. ncbi request reprint First principles simulation of reaction steps in the atomic layer deposition of titania: dependence of growth on Lewis acidity of titanocene precursor
    Aleksandra Zydor
    Tyndall National Institute, University College Cork, Lee Maltings, Cork, Ireland
    Phys Chem Chem Phys 14:7954-64. 2012
  6. doi request reprint Chiral shells and achiral cores in CdS quantum dots
    Simon D Elliott
    Tyndall National Institute, Lee Maltings, Cork, Ireland
    Nano Lett 8:2452-7. 2008
  7. ncbi request reprint The p-type conduction mechanism in Cu2O: a first principles study
    Michael Nolan
    Tyndall National Institute, Lee Maltings, Prospect Row, Cork, Ireland
    Phys Chem Chem Phys 8:5350-8. 2006
  8. doi request reprint Modeling Mechanism and Growth Reactions for New Nanofabrication Processes by Atomic Layer Deposition
    Simon D Elliott
    Tyndall National Institute, University College Cork, Lee Maltings, Dyke Parade, Cork, Ireland
    Adv Mater 28:5367-80. 2016

Collaborators

  • Yurii K Gun'ko
  • Michael Nolan
  • Mahdi Shirazi
  • Gangotri Dey
  • Yasheng Maimaiti
  • Aleksandra Zydor
  • Lynette Keeney
  • Dirk J Hagen
  • Jacqueline S Wrench
  • Vadim G Kessler

Detail Information

Publications8

  1. doi request reprint Mechanism, products, and growth rate of atomic layer deposition of noble metals
    Simon D Elliott
    Tyndall National Institute, University College Cork, Lee Maltings, Cork, Ireland
    Langmuir 26:9179-82. 2010
    ..To validate the mechanism against experiment, we derive analytical expressions for product ratios and the growth rate in terms of saturating coverages...
  2. doi request reprint Quantum chemical and solution phase evaluation of metallocenes as reducing agents for the prospective atomic layer deposition of copper
    Gangotri Dey
    Tyndall National Institute, University College Cork, Lee Malting s, Dyke Parade, Cork, Ireland
    Dalton Trans 44:10188-99. 2015
    ....
  3. doi request reprint Cooperation between adsorbates accounts for the activation of atomic layer deposition reactions
    Mahdi Shirazi
    Tyndall National Institute, University College Cork, Lee Maltings, Cork, Ireland
    Nanoscale 7:6311-8. 2015
    ..This explains the self-limiting nature of ALD. ..
  4. doi request reprint Reduction mechanisms of the CuO(111) surface through surface oxygen vacancy formation and hydrogen adsorption
    Yasheng Maimaiti
    Tyndall National Institute, University College Cork, Lee Maltings, Prospect Row, Cork, Ireland
    Phys Chem Chem Phys 16:3036-46. 2014
    ..Using H2 as the reducing agent, it is found that the CuO surface is reduced to Cu2O at approximately 360 K and that complete reduction from Cu2O to metallic Cu occurs at 780 K. ..
  5. ncbi request reprint First principles simulation of reaction steps in the atomic layer deposition of titania: dependence of growth on Lewis acidity of titanocene precursor
    Aleksandra Zydor
    Tyndall National Institute, University College Cork, Lee Maltings, Cork, Ireland
    Phys Chem Chem Phys 14:7954-64. 2012
    ..This crucial step in the sequence of ALD reactions is therefore not possible in the case of TiCp*(OMe)(3) + H(2)O, which means that there is no deposition of TiO(2) films...
  6. doi request reprint Chiral shells and achiral cores in CdS quantum dots
    Simon D Elliott
    Tyndall National Institute, Lee Maltings, Cork, Ireland
    Nano Lett 8:2452-7. 2008
    ..The quantum dot core is found to remain undistorted and achiral...
  7. ncbi request reprint The p-type conduction mechanism in Cu2O: a first principles study
    Michael Nolan
    Tyndall National Institute, Lee Maltings, Prospect Row, Cork, Ireland
    Phys Chem Chem Phys 8:5350-8. 2006
    ..These results demonstrate that the p-type semiconducting properties observed for Cu2O are explained by a small concentration of Cu vacancies...
  8. doi request reprint Modeling Mechanism and Growth Reactions for New Nanofabrication Processes by Atomic Layer Deposition
    Simon D Elliott
    Tyndall National Institute, University College Cork, Lee Maltings, Dyke Parade, Cork, Ireland
    Adv Mater 28:5367-80. 2016
    ..Self-limiting chemisorption of precursors onto substrates is studied using density functional theory so as to determine reaction pathways and aid process development. The main challenges for the future of ALD modeling are outlined. ..