- Feasibility study of hard-x-ray nanofocusing above 20 keV using compound photon sievesChangqing Xie
Key Laboratory of Microelectronics Devices and Integrated Technology, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, China
Opt Lett 35:4048-50. 2010..Further improvement of the high-aspect-ratio metal nanostructure process will allow CPSs to be a promising candidate for hard-x-ray nanofocusing in the high-energy region above 20 keV...
- Toward two-dimensional nanometer resolution hard X-ray differential-interference-contrast imaging using modified photon sievesChangqing Xie
Key Laboratory of Laboratory of Nano Fabrication and Novel Devices Integrated Technology, Institute of Microelectronics, Chinese Academy of Sciences, Beijing, China
Opt Lett 37:749-51. 2012..We anticipate that MPSs can provide a complementary and versatile high-resolution nondestructive imaging tool for ultra-large-scale integrated circuits at 45 nm node and below...