- Mask design for optical microlithography--an inverse imaging problemAmyn Poonawala
Computer Engineering Department, University of California, Santa Cruz, CA 95064, USA
IEEE Trans Image Process 16:774-88. 2007..We also employ the regularization framework to control the tone and complexity of the synthesized masks. Finally, we discuss the extension of our framework to coherent and (the more practical) partially coherent imaging systems...