Rainer J Beck

Summary

Affiliation: Heriot-Watt University
Country: UK

Publications

  1. doi Application of cooled spatial light modulator for high power nanosecond laser micromachining
    Rainer J Beck
    School of Engineering and Physical Sciences, Heriot Watt University, Edinburgh EH14 4AS, UK
    Opt Express 18:17059-65. 2010
  2. doi Compensation for time fluctuations of phase modulation in a liquid-crystal-on-silicon display by process synchronization in laser materials processing
    Rainer J Beck
    Applied Optics and Photonics Group, School of Engineering and Physical Sciences, Heriot Watt University, Edinburgh, EH14 4AS, UK
    Appl Opt 50:2899-905. 2011
  3. doi Application of a liquid crystal spatial light modulator to laser marking
    Jonathan P Parry
    Heriot Watt University, School of Engineering and Physical Sciences, Riccarton, Edinburgh, EH14 4AS, UK
    Appl Opt 50:1779-85. 2011

Collaborators

Detail Information

Publications3

  1. doi Application of cooled spatial light modulator for high power nanosecond laser micromachining
    Rainer J Beck
    School of Engineering and Physical Sciences, Heriot Watt University, Edinburgh EH14 4AS, UK
    Opt Express 18:17059-65. 2010
    ..Complex intensity patterns are generated, using the Inverse Fourier Transform Algorithm, and example laser machining is demonstrated. The SLM enables both complex beam shaping and also beam steering...
  2. doi Compensation for time fluctuations of phase modulation in a liquid-crystal-on-silicon display by process synchronization in laser materials processing
    Rainer J Beck
    Applied Optics and Photonics Group, School of Engineering and Physical Sciences, Heriot Watt University, Edinburgh, EH14 4AS, UK
    Appl Opt 50:2899-905. 2011
    ....
  3. doi Application of a liquid crystal spatial light modulator to laser marking
    Jonathan P Parry
    Heriot Watt University, School of Engineering and Physical Sciences, Riccarton, Edinburgh, EH14 4AS, UK
    Appl Opt 50:1779-85. 2011
    ..The dynamic nature of the device is utilized to improve mark quality by reducing the impact of the inherently speckled intensity distribution across the generated image and reduce thermal effects in the marked surface...