Oscar Vazquez-Mena

Summary

Country: Switzerland

Publications

  1. doi Metallic nanowires by full wafer stencil lithography
    O Vazquez-Mena
    Microsystems Laboratory, Ecole Polytechnique Federale de Lausanne, 1015 Lausanne, Switzerland
    Nano Lett 8:3675-82. 2008
  2. doi Analysis of the blurring in stencil lithography
    O Vazquez-Mena
    Microsystems Laboratory, Ecole Polytechnique Federale de Lausanne, 1015, Lausanne, Switzerland
    Nanotechnology 20:415303. 2009
  3. doi Metallic nanodot arrays by stencil lithography for plasmonic biosensing applications
    Oscar Vazquez-Mena
    Microsystems Laboratory, Ecole Polytechnique Fédérale de Lausanne, 1015 Lausanne, Switzerland
    ACS Nano 5:844-53. 2011
  4. doi High-resolution resistless nanopatterning on polymer and flexible substrates for plasmonic biosensing using stencil masks
    Oscar Vazquez-Mena
    Microsystems Laboratory, Ecole Polytechnique Federale de Lausanne EPFL, 1015 Lausanne, Switzerland
    ACS Nano 6:5474-81. 2012
  5. doi Facile fabrication of nanofluidic diode membranes using anodic aluminium oxide
    Songmei Wu
    Microsystems Laboratory, Ecole Polytechnique Federale de Lausanne, EPFL STI IMT LMIS, Station 17, 1015 Lausanne, Switzerland
    Nanoscale 4:5718-23. 2012
  6. ncbi Compliant membranes improve resolution in full-wafer micro/nanostencil lithography
    Katrin Sidler
    Microsystems Laboratory, Ecole Polytechnique Federale de Lausanne EPFL, 1015, Lausanne, Switzerland
    Nanoscale 4:773-8. 2012

Collaborators

Detail Information

Publications6

  1. doi Metallic nanowires by full wafer stencil lithography
    O Vazquez-Mena
    Microsystems Laboratory, Ecole Polytechnique Federale de Lausanne, 1015 Lausanne, Switzerland
    Nano Lett 8:3675-82. 2008
    ..This proves the capability of stencil lithography for the fabrication of metallic nanowires on a full wafer scale...
  2. doi Analysis of the blurring in stencil lithography
    O Vazquez-Mena
    Microsystems Laboratory, Ecole Polytechnique Federale de Lausanne, 1015, Lausanne, Switzerland
    Nanotechnology 20:415303. 2009
    ..We also show that the blurring can be reduced by decreasing the nominal deposition thickness, the deposition rate and the substrate temperature...
  3. doi Metallic nanodot arrays by stencil lithography for plasmonic biosensing applications
    Oscar Vazquez-Mena
    Microsystems Laboratory, Ecole Polytechnique Fédérale de Lausanne, 1015 Lausanne, Switzerland
    ACS Nano 5:844-53. 2011
    ..These results demonstrate the potential of stencil lithography for the realization of plasmon-based biosensing devices...
  4. doi High-resolution resistless nanopatterning on polymer and flexible substrates for plasmonic biosensing using stencil masks
    Oscar Vazquez-Mena
    Microsystems Laboratory, Ecole Polytechnique Federale de Lausanne EPFL, 1015 Lausanne, Switzerland
    ACS Nano 6:5474-81. 2012
    ..These results demonstrate high-resolution nanopatterning and device nanofabrication capability of stencil lithography on polymer and flexible substrates...
  5. doi Facile fabrication of nanofluidic diode membranes using anodic aluminium oxide
    Songmei Wu
    Microsystems Laboratory, Ecole Polytechnique Federale de Lausanne, EPFL STI IMT LMIS, Station 17, 1015 Lausanne, Switzerland
    Nanoscale 4:5718-23. 2012
    ..Our hetero-structured nanopore arrays provide a valuable platform for high throughput applications such as molecular separation, chemical processors and energy conversion...
  6. ncbi Compliant membranes improve resolution in full-wafer micro/nanostencil lithography
    Katrin Sidler
    Microsystems Laboratory, Ecole Polytechnique Federale de Lausanne EPFL, 1015, Lausanne, Switzerland
    Nanoscale 4:773-8. 2012
    ..The blurring in the case of compliant membranes is up to 95% reduced on full-wafer scale compared to standard (non-compliant) membranes...