Precision depth measurement of through silicon vias (TSVs) on 3D semiconductor packaging processJonghan Jin
Center for Length, Korea Research Institute of Standards and Science, Daejeon, South Korea
Opt Express 20:5011-6. 2012
..This measurement was done at high speed based on spectral resolved interferometry. The proposed method is expected to be an alternative method for depth inspection of TSVs...
Thickness and refractive index measurement of a silicon wafer based on an optical combJonghan Jin
Center for Length and Time, Division of Physical Metrology, Korea Research Institute of Standards and Science KRISS, Science Town, Daejeon, 305 340, Republic of Korea
Opt Express 18:18339-46. 2010
..85 microm and 3.50, respectively. The measurement uncertainty for the geometrical thickness was evaluated as 0.95 microm (k = 1) using a preliminary setup...
Visibility enhanced interferometer based on an injection-locking technique for low reflective materialsJonghan Jin
Center for Length and Time, Division of Physical Metrology, Korea Research Institute of Standards and Science KRISS, 267 Gajeong ro, Yuseong Gu, Daejeon, 305 340, Korea
Opt Express 18:23517-22. 2010
..6%, we obtained almost the same visibility as a metal coated mirror. The suggested visibility enhanced interferometer can be widely used for measuring low reflective materials...
Uncertainty improvement of geometrical thickness and refractive index measurement of a silicon wafer using a femtosecond pulse laserSaerom Maeng
Center for Length, Division of Physical Metrology, Korea Research Institute of Standards and Science, 267 Gajeong ro, Yuseong Gu, Daejeon 305 340, South Korea
Opt Express 20:12184-90. 2012
..7 μm, which was an improvement of about 20 times that obtained by the previous method...
An optical absolute position measurement method using a phase-encoded single track binary codeJong Ahn Kim
Center for Length, Korea Research Institute of Standards and Science, 267 Gajeong ro, Yuseong Gu, Daejeon 305 340, South Korea
Rev Sci Instrum 83:115115. 2012
..In the comparison results with a laser interferometer, the measurement system shows the resolution of less than 50 nm and the nonlinearity error of less than ±60 nm after compensation...
Note: High speed optical profiler based on a phase-shifting technique using frequency-scanning lasersJong Ahn Kim
Center for Length, Korea Research Institute of Standards and Science, Yuseong Gu, Daejeon, South Korea
Rev Sci Instrum 82:086111. 2011
..We also present measurements of microscopic structures to verify the HSOP's ability to perform high speed inline inspection for the semiconductor and flat-panel display industries...
Note: High precision angle generator using multiple ultrasonic motors and a self-calibratable encoderJong Ahn Kim
Center for Length, Korea Research Institute of Standards and Science, 267 Gajeong ro, Yuseong Gu, Daejeon 305 340, South Korea
Rev Sci Instrum 82:116108. 2011
..The expanded uncertainty (k = 2) in the angle generation was estimated less than 0.03", which included the calibrated scale error and the nonlinearity error...
A wide-range optical frequency generator based on the frequency comb of a femtosecond laserYoung Jin Kim
Billionth Uncertainty Precision Engineering Group, Korea Advanced Institute of Science and Technology KAIST, Science Town, Daejeon, 305 701, South Korea
Opt Express 16:258-64. 2008
..These outstanding performances of optical frequency generation could find applications in high precision spectroscopy, frequency calibration, and length metrology...