Affiliation: Friedrich Schiller University
- Plasmonic properties of aluminum nanorings generated by double patterningDennis Lehr
Institute of Applied Physics, Friedrich Schiller Universitat Jena, Jena, Germany
Opt Lett 37:157-9. 2012..Based on this model, the redepositions are quantified, the plasmonic properties are investigated, and a design tool for the very general class of nanofabrication techniques involving the etching of metals is provided...
- Simulating different manufactured antireflective sub-wavelength structures considering the influence of local topographic variationsDennis Lehr
Carl Zeiss Jena GmbH, Carl Zeiss Promenade 10, 07745 Jena, Germany
Opt Express 18:23878-90. 2010..Especially the transmittance reduction in the deep-UV could be ascribed to these variations in the sub-wavelength structures...
- Circular dichroism from chiral nanomaterial fabricated by on-edge lithographyKay Dietrich
Institute of Applied Physics, Abbe Center of Photonics, Friedrich Schiller Universitat Jena, Max Wien Platz 1, 07743 Jena, Germany
Adv Mater 24:OP321-5. 2012..Applying on-edge lithography, a large area with these nanostructures is efficiently covered. This fabrication method offers tunability of the operation bandwidth by tailoring the chiral shape...
- Antireflective "moth-eye" structures on tunable optical silicone membranesRobert Brunner
University of Applied Sciences Jena, Carl Zeiss Promenade 2, 07745 Jena, Germany
Appl Opt 51:4370-6. 2012..A significant transmittance enhancement of up to 2.5% is achieved over the entire visible spectrum, which means that more than half of the surface reflection losses are compensated by the AR structures...