Dennis Lehr

Summary

Affiliation: Friedrich Schiller University
Country: Germany

Publications

  1. doi request reprint Plasmonic properties of aluminum nanorings generated by double patterning
    Dennis Lehr
    Institute of Applied Physics, Friedrich Schiller Universitat Jena, Jena, Germany
    Opt Lett 37:157-9. 2012
  2. doi request reprint Simulating different manufactured antireflective sub-wavelength structures considering the influence of local topographic variations
    Dennis Lehr
    Carl Zeiss Jena GmbH, Carl Zeiss Promenade 10, 07745 Jena, Germany
    Opt Express 18:23878-90. 2010
  3. doi request reprint Circular dichroism from chiral nanomaterial fabricated by on-edge lithography
    Kay Dietrich
    Institute of Applied Physics, Abbe Center of Photonics, Friedrich Schiller Universitat Jena, Max Wien Platz 1, 07743 Jena, Germany
    Adv Mater 24:OP321-5. 2012
  4. doi request reprint Antireflective "moth-eye" structures on tunable optical silicone membranes
    Robert Brunner
    University of Applied Sciences Jena, Carl Zeiss Promenade 2, 07745 Jena, Germany
    Appl Opt 51:4370-6. 2012

Collaborators

  • Kay Dietrich
  • Robert Brunner
  • Bettina Keil
  • Joachim Spatz
  • Christian Helgert
  • Ulrike Wallrabe
  • Andreas T√ľnnermann
  • Jan Draheim
  • Christoph Morhard
  • Ernst Bernhard Kley

Detail Information

Publications4

  1. doi request reprint Plasmonic properties of aluminum nanorings generated by double patterning
    Dennis Lehr
    Institute of Applied Physics, Friedrich Schiller Universitat Jena, Jena, Germany
    Opt Lett 37:157-9. 2012
    ..Based on this model, the redepositions are quantified, the plasmonic properties are investigated, and a design tool for the very general class of nanofabrication techniques involving the etching of metals is provided...
  2. doi request reprint Simulating different manufactured antireflective sub-wavelength structures considering the influence of local topographic variations
    Dennis Lehr
    Carl Zeiss Jena GmbH, Carl Zeiss Promenade 10, 07745 Jena, Germany
    Opt Express 18:23878-90. 2010
    ..Especially the transmittance reduction in the deep-UV could be ascribed to these variations in the sub-wavelength structures...
  3. doi request reprint Circular dichroism from chiral nanomaterial fabricated by on-edge lithography
    Kay Dietrich
    Institute of Applied Physics, Abbe Center of Photonics, Friedrich Schiller Universitat Jena, Max Wien Platz 1, 07743 Jena, Germany
    Adv Mater 24:OP321-5. 2012
    ..Applying on-edge lithography, a large area with these nanostructures is efficiently covered. This fabrication method offers tunability of the operation bandwidth by tailoring the chiral shape...
  4. doi request reprint Antireflective "moth-eye" structures on tunable optical silicone membranes
    Robert Brunner
    University of Applied Sciences Jena, Carl Zeiss Promenade 2, 07745 Jena, Germany
    Appl Opt 51:4370-6. 2012
    ..A significant transmittance enhancement of up to 2.5% is achieved over the entire visible spectrum, which means that more than half of the surface reflection losses are compensated by the AR structures...