Thomas Defforge

Summary

Country: France

Publications

  1. pmc Plasma-deposited fluoropolymer film mask for local porous silicon formation
    Thomas Defforge
    Universite Francois Rabelais de Tours, GREMAN UMR CNRS 7347, 16 Rue Pierre et Marie Curie, BP 7155, Tours Cedex 2, 37071, France
    Nanoscale Res Lett 7:344. 2012
  2. pmc Copper-selective electrochemical filling of macropore arrays for through-silicon via applications
    Thomas Defforge
    Universite Francois Rabelais de Tours, GREMAN UMR CNRS 7347, 16 Rue Pierre et Marie Curie, BP 7155, Tours Cedex 2, 37071, France
    Nanoscale Res Lett 7:375. 2012

Detail Information

Publications2

  1. pmc Plasma-deposited fluoropolymer film mask for local porous silicon formation
    Thomas Defforge
    Universite Francois Rabelais de Tours, GREMAN UMR CNRS 7347, 16 Rue Pierre et Marie Curie, BP 7155, Tours Cedex 2, 37071, France
    Nanoscale Res Lett 7:344. 2012
    ..Unlike most of other masks, fluoropolymer removal after electrochemical etching is rapid and does not alter the porous layer. Local porous regions were thus fabricated both in p+-type and low-doped n-type silicon substrates...
  2. pmc Copper-selective electrochemical filling of macropore arrays for through-silicon via applications
    Thomas Defforge
    Universite Francois Rabelais de Tours, GREMAN UMR CNRS 7347, 16 Rue Pierre et Marie Curie, BP 7155, Tours Cedex 2, 37071, France
    Nanoscale Res Lett 7:375. 2012
    ..Using this process, high density conductive via (4.5 × 105 cm-²) was carried out. The conductive paths were then electrically characterized, and a resistance equal to 32 mΩ/copper-filled macropore was determined...