Shi yuan Liu

Summary

Affiliation: Huazhong University of Science and Technology
Country: China

Publications

  1. pmc Concentration gradient induced morphology evolution of silica nanostructure growth on photoresist-derived carbon micropatterns
    Dan Liu
    Wuhan National Laboratory for Optoelectronics, Huazhong University of Science and Technology, Wuhan, 430074, China
    Nanoscale Res Lett 7:496. 2012
  2. doi request reprint Convolution-variation separation method for efficient modeling of optical lithography
    Shiyuan Liu
    Wuhan National Laboratory for Optoelectronics, Huazhong University of Science and Technology, Wuhan 430074, China
    Opt Lett 38:2168-70. 2013
  3. doi request reprint Iterative method for in situ measurement of lens aberrations in lithographic tools using CTC-based quadratic aberration model
    Shiyuan Liu
    Wuhan National Laboratory for Optoelectronics, Huazhong University of Science and Technology, Wuhan 430074, China
    Opt Express 20:14272-83. 2012
  4. ncbi request reprint Kernel-based parametric analytical model of source intensity distributions in lithographic tools
    Shiyuan Liu
    Wuhan National Laboratory for Optoelectronics, Huazhong University of Science and Technology, Wuhan, China
    Appl Opt 51:1479-86. 2012
  5. ncbi request reprint [Model-based FTIR reflectometry measurement system for deep trench structures of DRAM]
    Shi yuan Liu
    State Key Laboratory of Digital Manufacturing Equipment and Technology, Huazhong University of Science and Technology, Wuhan 430074, China
    Guang Pu Xue Yu Guang Pu Fen Xi 29:935-9. 2009

Collaborators

  • Wei Liu
  • Dan Liu
  • Tielin Shi
  • Shuang Xi
  • Xiaoping Li
  • Zirong Tang
  • Wuxing Lai

Detail Information

Publications5

  1. pmc Concentration gradient induced morphology evolution of silica nanostructure growth on photoresist-derived carbon micropatterns
    Dan Liu
    Wuhan National Laboratory for Optoelectronics, Huazhong University of Science and Technology, Wuhan, 430074, China
    Nanoscale Res Lett 7:496. 2012
    ..The present approach offers a potential method for precise design and controlled synthesis of nanostructures with different features...
  2. doi request reprint Convolution-variation separation method for efficient modeling of optical lithography
    Shiyuan Liu
    Wuhan National Laboratory for Optoelectronics, Huazhong University of Science and Technology, Wuhan 430074, China
    Opt Lett 38:2168-70. 2013
    ..Optical image simulations for defocus and aberration variations with applications in robust inverse lithography technology and lens aberration metrology have demonstrated the main concept of the CVS method. ..
  3. doi request reprint Iterative method for in situ measurement of lens aberrations in lithographic tools using CTC-based quadratic aberration model
    Shiyuan Liu
    Wuhan National Laboratory for Optoelectronics, Huazhong University of Science and Technology, Wuhan 430074, China
    Opt Express 20:14272-83. 2012
    ..It is fully expected that this method will provide a useful practical means for the in-line monitoring of the imaging quality of lithographic tools...
  4. ncbi request reprint Kernel-based parametric analytical model of source intensity distributions in lithographic tools
    Shiyuan Liu
    Wuhan National Laboratory for Optoelectronics, Huazhong University of Science and Technology, Wuhan, China
    Appl Opt 51:1479-86. 2012
    ..We fully expected that the proposed analytical model will provide both simulation conditions and a theoretical basis for the resolution enhancement technique and related research fields...
  5. ncbi request reprint [Model-based FTIR reflectometry measurement system for deep trench structures of DRAM]
    Shi yuan Liu
    State Key Laboratory of Digital Manufacturing Equipment and Technology, Huazhong University of Science and Technology, Wuhan 430074, China
    Guang Pu Xue Yu Guang Pu Fen Xi 29:935-9. 2009
    ..It is expected that the proposed technique will find potential applications in the on-line monitoring and process control for microelectronics and microelectromechanical system (MEMS) manufacturing...